Fabrication of refractive microlens arrays by visible irradiation of acrylic monomers: influence of photonic parameters

被引：21

作者：

Croutxe-Barghorn, C ^{[1
]}

Soppera, O ^{[1
]}

Lougnot, DJ ^{[1
]}

机构：

[1] ENSC Mulhouse, Dept Photochim Gen, UMR 7525, F-68093 Mulhouse, France

来源：

EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS | 2001年 / 13卷 / 01期

关键词：

D O I：

10.1051/epjap:2001110

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The fabrication of refractive microlenses with self-developing photopolymers is reported. A spatially controlled illumination of the photosensitive layer induced an inhomogeneous photopolymerization involving formation of 3-D polymer network, mass-transport process of reactive species and bending of the surface. The process exhibited a completely self-processing character without any chemical post-treatment to reveal the relief. The lens arrays displayed diameters ranging from less than 100 mum to 1 mm and focal lengths from 100 mum to a few millimeters, depending on photonic, optical and physico-chemical parameters. The paper focuses on the importance of photonic parameters in the generation of microlens arrays and discusses the flexibility of this technique in the visible range.

引用

页码：31 / 37

页数：7

共 17 条

[1]

[Anonymous], 1995, PHOTOINITIATION PHOT

[2] MICROLENS ARRAYS PRODUCED BY A PHOTOLYTIC TECHNIQUE [J].

BORRELLI, NF ;

MORSE, DL .

APPLIED OPTICS, 1988, 27 (03) :476-479

[3] PHOTOPOLYMERS FOR HOLOGRAPHIC RECORDING - FROM STANDARD TO SELF-PROCESSING MATERIALS [J].

CARRE, C ;

LOUGNOT, DJ .

JOURNAL DE PHYSIQUE III, 1993, 3 (07) :1445-1460

[4] Interdependence of volume shrinkage, spatial frequency and mass transfer in relief gratings fabricated with self-processing photopolymers [J].

Croutxe-Barghorn, C ;

Lougnot, DJ .

PHOTOPOLYMER DEVICE PHYSICS, CHEMISTRY, AND APPLICATIONS IV, 1998, 3417 :208-215

[5]

Croutxé-Barghorn C, 2000, ADV MATER OPT ELECTR, V10, P25, DOI 10.1002/1099-0712(200001/02)10:1<25::AID-AMO395>3.0.CO

[6]

2-I

[7]

Croutxe-Barghorn C., 1996, Pure and Applied Optics, V5, P811, DOI 10.1088/0963-9659/5/6/007

[8] Self-developing photopolymer for the fabrication of relief micro-optical elements [J].

CroutxeBarghorn, C ;

Calixto, S ;

Lougnot, J .

PHOTOSENSITIVE OPTICAL MATERIALS AND DEVICES, 1997, 2998 :222-231

[9]

Decker C., 1993, RAD CURING POLYM SCI, P33

[10] Transferring resist microlenses into silicon by reactive ion etching [J].

Eisner, M ;

Schwider, J .

OPTICAL ENGINEERING, 1996, 35 (10) :2979-2982

← 1 2 →