CVD growth and morphology of transition-metal phosphides

被引:10
作者
Fujii, M
Iwanaga, H
Motojima, S
机构
[1] NAGASAKI UNIV,FAC LIBERAL ARTS,NAGASAKI 852,JAPAN
[2] GIFU UNIV,FAC ENGN,DEPT APPL CHEM,GIFU 50111,JAPAN
关键词
D O I
10.1016/0022-0248(95)00525-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Whiskers of beta-HfP (hexagonal), alpha-ZrP (cubic), and beta-TiP (hexagonal) have been prepared from HfCl4/ZrCl4/TiCl4 + PCl3 + H-2 + Ar gas mixtures at 1050-1250 degrees C using the mixed-metal impurity-activated chemical-vapor-deposition process. The growth conditions, morphology, and other properties were examined. The mixed impurities of Si + Pt and Si + Pd were very effective for the growth of these whiskers. The growth direction of HfP and TiP is the c-axis, and that of ZrP is (111) and the a-axis. Some whiskers changed their growth axes from one orientation to another during growth. The whiskers were very stable during a 40 min immersion in a concentrated HCl solution.
引用
收藏
页码:99 / 103
页数:5
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