Realization of a scale of absolute spectral response using the national institute of standards and technology high-accuracy cryogenic radiometer

被引:107
作者
Gentile, TR
Houston, JM
Cromer, CL
机构
[1] National Institute of Standards and Technology, Gaithersburg, MD
来源
APPLIED OPTICS | 1996年 / 35卷 / 22期
关键词
D O I
10.1364/AO.35.004392
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Using the National Institute of Standards and Technology high-accuracy cryogenic radiometer (HACR), we have realized a scale of absolute spectral response between 406 and 920 nm. The HACR, an electrical-substitution radiometer operating at cryogenic temperatures, achieves a combined relative standard uncertainty of 0.021%. Silicon photodiode light-trapping detectors were calibrated against the HACR with a typical relative standard uncertainty of 0.03% at nine laser wavelengths between 406 and 920 nm. Modeling of the quantum efficiency of these detectors yields their responsivity throughout this range with comparable accuracy.
引用
收藏
页码:4392 / 4403
页数:12
相关论文
共 29 条
[1]   SPECTROSCOPIC ANALYSIS OF THE INTERFACE BETWEEN SI AND ITS THERMALLY GROWN OXIDE [J].
ASPNES, DE ;
THEETEN, JB .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (06) :1359-1365
[2]  
BEVINGTON PR, 1969, DATA REDUCTION ERROR, pCH10
[3]  
BORN M, 1980, PRINCIPLES OPTICS, P632
[4]   INTRINSIC OPTICAL ABSORPTION IN GERMANIUM-SILICON ALLOYS [J].
BRAUNSTEIN, R ;
MOORE, AR ;
HERMAN, F .
PHYSICAL REVIEW, 1958, 109 (03) :695-710
[5]  
CROMER CL, 1991, 1991 MEAS SCI C AN C
[6]   INTRINSIC OPTICAL ABSORPTION IN SINGLE-CRYSTAL GERMANIUM AND SILICON AT 77-DEGREES-K AND 300-DEGREES-K [J].
DASH, WC ;
NEWMAN, R .
PHYSICAL REVIEW, 1955, 99 (04) :1151-1155
[7]  
EDWARDS DF, 1985, HDB OPTICAL CONSTANT, P547, DOI DOI 10.1016/B978-0-08-054721-3.50029-0
[8]   TRAP DETECTORS AND THEIR PROPERTIES [J].
FOX, NP .
METROLOGIA, 1991, 28 (03) :197-202
[9]   QUANTUM EFFICIENCY OF THE P-N-JUNCTION IN SILICON AS AN ABSOLUTE RADIOMETRIC STANDARD [J].
GEIST, J .
APPLIED OPTICS, 1979, 18 (06) :760-762
[10]   SPECTRAL RESPONSE SELF-CALIBRATION AND INTERPOLATION OF SILICON PHOTO-DIODES [J].
GEIST, J ;
ZALEWSKI, EF ;
SCHAEFER, AR .
APPLIED OPTICS, 1980, 19 (22) :3795-3799