Structural characterisation of hydrogenated a-Si using slow positron beam techniques

被引:9
作者
Britton, DT [1 ]
Hempel, A
Knoesen, D
Bauer-Kugelmann, W
Triftshäuser, W
机构
[1] Univ Cape Town, Dept Phys, ZA-7701 Rondebosch, South Africa
[2] Univ Western Cape, Dept Phys, ZA-7530 Bellville, South Africa
[3] Univ Bundeswehr Munchen, Inst Nukl Festkorperphys, D-85577 Neubiberg, Germany
基金
新加坡国家研究基金会;
关键词
amorphous silicon; positron beam; hot wire CVD; defects;
D O I
10.1016/S0168-583X(99)01053-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Hydrogenated amorphous silicon (a-Si:H) grown by hot wire chemical vapour deposition is a promising candidate for robust inexpensive solar cells. However, prolonged exposure to light is known to lead to a reduction in efficiency of a-Si:H devices. The causes for this ageing effect are still unclear, but may be related to a structural relaxation or change in hydrogen content. In this work, results are presented for positron beam studies of the defect structure, using both lifetime and Doppler-broadening spectroscopy, of a-Si:H grown under different conditions. (C) 2000 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1010 / 1015
页数:6
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