Influence of epitaxial strain on the ferromagnetic semiconductor EuO: First-principles calculations

被引:101
作者
Ingle, N. J. C. [1 ]
Elfimov, I. S. [1 ]
机构
[1] Univ British Columbia, Adv Mat & Proc Engn Lab, Vancouver, BC V5Z 1M9, Canada
来源
PHYSICAL REVIEW B | 2008年 / 77卷 / 12期
关键词
D O I
10.1103/PhysRevB.77.121202
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
From first-principles calculations we investigate the electronic structure and the magnetic properties of EuO under hydrostatic stress and the appropriate biaxial stress for epitaxial films. There is a complex interdependence of the O 2p and Eu 4f and 5d bands on the magnetism in EuO, and decreasing lattice parameters is an ideal method to increase the Curie temperature T(c). Compared to hydrostatic pressure, the out-of-plane compensation that is available to epitaxial films diminishes this increase in Tc, although the Tc increase is nonetheless significant due to the small value of Poisson's ratio for EuO. We find the semiconducting gap closes at a 6% in-plane lattice compression for epitaxy, at which point a significant conceptual change must occur in the active exchange mechanisms.
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页数:4
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