Patterning of nanostructured thin films by structured light illumination

被引:24
作者
Haro-Poniatowski, E
Fort, E
Lacharme, JP
Ricolleau, C
机构
[1] Univ Paris 07, Lab Mat & Phenomenes Quant, CNRS, UMR 7162, F-75005 Paris, France
[2] ESPCI, Lab Phys Solide, F-75005 Paris, France
[3] Univ Autonoma Metropolitana Iztapalapa, Dept Fis, Mexico City 09340, DF, Mexico
关键词
D O I
10.1063/1.2061857
中图分类号
O59 [应用物理学];
学科分类号
摘要
Light-induced reshaping of silver nanostructured films near the percolation threshold are investigated using a KrF excimer laser emitting at 248 nm. Depending on the laser intensity and the number of pulses, striking effects are observed for which the irregular particles melt and transform into spherical shaped particles. We show that the laser-induced modifications can be spatially designed by irradiating through masks and gratings taking advantage of their respective diffractive properties. This permits an easy and well controlled way to produce a variety of submicron patterning. The induced patterns accurately coincide with the intensity variations of the illumination field. (C) 2005 American Institute of Physics.
引用
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页码:1 / 3
页数:3
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