Intrinsic electron accumulation at clean InN surfaces

被引:430
作者
Mahboob, I [1 ]
Veal, TD
McConville, CF
Lu, H
Schaff, WJ
机构
[1] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England
[2] Cornell Univ, Dept Elect & Comp Engn, Ithaca, NY 14853 USA
关键词
D O I
10.1103/PhysRevLett.92.036804
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The electronic structure of clean InN(0001) surfaces has been investigated by high-resolution electron-energy-loss spectroscopy of the conduction band electron plasmon excitations. An intrinsic surface electron accumulation layer is found to exist and is explained in terms of a particularly low Gamma-point conduction band minimum in wurtzite InN. As a result, surface Fermi level pinning high in the conduction band in the vicinity of the Gamma point, but near the average midgap energy, produces charged donor-type surface states with associated downward band bending. Semiclassical dielectric theory simulations of the energy-loss spectra and charge-profile calculations indicate a surface state density of 2.5 (+/-0.2)x10(13) cm(-2) and a surface Fermi level of 1.64+/-0.10 eV above the valence band maximum.
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页数:4
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