Initiated chemical vapor deposition (iCVD) of polymeric nanocoatings

被引：64

作者：

Martin, Tyler P.

Lau, Kenneth K. S.

Chan, Kelvin

Mao, Yu

Gupta, Malancha

O'Shaughnessy, Av. Shannan

Gleason, Karen K.

机构：

[1] MIT, Dept Chem Engn, Cambridge, MA 02139 USA

[2] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

来源：

SURFACE & COATINGS TECHNOLOGY | 2007年 / 201卷 / 22-23期

基金：

美国国家科学基金会; 美国国家卫生研究院;

关键词：

chemical vapor deposition; polymer thin film; polymer coating; antimicrobial; plasma polymerization; HWCVD;

D O I：

10.1016/j.surfcoat.2007.05.003

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Initiated chemical vapor deposition of polymers (iCVD) is a process similar to hot-wire CVD (HWCVD) in which a free-radical initiating species is employed to greatly increase the growth rate while decreasing the required energy input. In general, iCVD allows for the deposition of linear polymer, copolymer and/or crosslinked films with a wide range of functions. Surveyed examples include antimicrobial, superhydrophobic, superhydrophilic, and other functional thin polymer films and coatings. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：9400 / 9405

页数：6

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