Asynchronous-pulse ultrasonic spray pyrolysis deposition of CuxS (x=1, 2) thin films

被引：123

作者：

Wang, SY ^{[1
]}

Wang, W

Lu, ZH

机构：

[1] Southeast Univ, Natl Lab Mol & Biomol Elect, Nanjing 210096, Peoples R China

[2] Nanjing Normal Univ, Coll Phys & Technol, Nanjing 210097, Peoples R China

来源：

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2003年 / 103卷 / 02期

基金：

中国国家自然科学基金;

关键词：

pyrolysis; deposition process; copper sulfide; thin films;

D O I：

10.1016/S0921-5107(03)00199-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanocrystalline CuxS (x = 1, 2) thin films were deposited by asynchronous-pulse ultrasonic spray pyrolysis (APUSP) technique on glass from CuCl2 and thiourea at relatively low temperature without any complexing agent. The deposited films chemically close to CuS were found to be polycrystalline phases, while the Cu2S films were a mixture of amorphous and polycrystalline as well. The crystalline phase of particles was highly depended on the molar ratio of thiourea to CuCl, and the pyrolysis temperature. The growth of CuxS thin films was controlled successfully by the improved APUSP method. Characterization of the films has been carried out using X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. XRD and XPS analysis showed stoichiometric CuxS (covellite CuS and chalcolite Cu2S). Raman shifts of the films were measured at 474 cm(-1) (CuS) and 472 cm(-1) (Cu2S). (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：184 / 188

页数：5

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