Polymer bonding process for nanolithography

被引:41
作者
Borzenko, T [1 ]
Tormen, M
Schmidt, G
Molenkamp, LW
Janssen, H
机构
[1] Univ Wurzburg, Inst Phys, D-97074 Wurzburg, Germany
[2] Eindhoven Univ Technol, Lab Macromol & Organ Chem, NL-5600 MB Eindhoven, Netherlands
关键词
D O I
10.1063/1.1406561
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have developed a lithography process which originates from imprint lithography and offers advantages over it. Unlike imprint lithography, not only the sample but also the mold is covered with a thermoplastic polymer. The mold and sample are brought into contact, pressed together and heated above the glass transition temperature of the thermoplast, causing the two polymer layers to become bonded (glued) together. A special treatment of the mold and sample surface causes the polymer film to stick only to the substrate after cooling. The bonding occurs at pressures and temperatures lower than those usually applied in imprint technology, and eliminates problems in conventional imprint technology that are related to lateral transport of the polymer. (C) 2001 American Institute of Physics.
引用
收藏
页码:2246 / 2248
页数:3
相关论文
共 14 条
  • [1] 30 NM RESOLUTION ZERO PROXIMITY LITHOGRAPHY ON HIGH-Z SUBSTRATES
    ATKINSON, GM
    STRATTON, FP
    KUBENA, RL
    WOLFE, JC
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 3104 - 3108
  • [2] Lithography beyond light: Microcontact printing with monolayer resists
    Biebuyck, HA
    Larsen, NB
    Delamarche, E
    Michel, B
    [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1997, 41 (1-2) : 159 - 170
  • [3] FABRICATION OF SUB-10 NM STRUCTURES BY LIFT-OFF AND BY ETCHING AFTER ELECTRON-BEAM EXPOSURE OF POLY(METHYLMETHACRYLATE) RESIST ON SOLID SUBSTRATES
    CHEN, W
    AHMED, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2519 - 2523
  • [4] Imprint lithography with 25-nanometer resolution
    Chou, SY
    Krauss, PR
    Renstrom, PJ
    [J]. SCIENCE, 1996, 272 (5258) : 85 - 87
  • [5] IMPRINT OF SUB-25 NM VIAS AND TRENCHES IN POLYMERS
    CHOU, SY
    KRAUSS, PR
    RENSTROM, PJ
    [J]. APPLIED PHYSICS LETTERS, 1995, 67 (21) : 3114 - 3116
  • [6] Nanoimprint lithography
    Chou, SY
    Krauss, PR
    Renstrom, PJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 4129 - 4133
  • [7] Step and flash imprint lithography: A new approach to high-resolution patterning
    Colburn, M
    Johnson, S
    Stewart, M
    Damle, S
    Bailey, T
    Choi, B
    Wedlake, M
    Michaelson, T
    Sreenivasan, SV
    Ekerdt, J
    Willson, CG
    [J]. EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 379 - 389
  • [8] Early K., 1990, Microelectronic Engineering, V11, P317, DOI 10.1016/0167-9317(90)90122-A
  • [9] Mold-assisted nanolithography: A process for reliable pattern replication
    Haisma, J
    Verheijen, M
    vandenHeuvel, K
    vandenBerg, J
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 4124 - 4128
  • [10] Harriott L. R., 1998, Materials Science in Semiconductor Processing, V1, P93, DOI 10.1016/S1369-8001(98)00019-5