共 14 条
- [1] 30 NM RESOLUTION ZERO PROXIMITY LITHOGRAPHY ON HIGH-Z SUBSTRATES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 3104 - 3108
- [3] FABRICATION OF SUB-10 NM STRUCTURES BY LIFT-OFF AND BY ETCHING AFTER ELECTRON-BEAM EXPOSURE OF POLY(METHYLMETHACRYLATE) RESIST ON SOLID SUBSTRATES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2519 - 2523
- [5] IMPRINT OF SUB-25 NM VIAS AND TRENCHES IN POLYMERS [J]. APPLIED PHYSICS LETTERS, 1995, 67 (21) : 3114 - 3116
- [6] Nanoimprint lithography [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 4129 - 4133
- [7] Step and flash imprint lithography: A new approach to high-resolution patterning [J]. EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 379 - 389
- [8] Early K., 1990, Microelectronic Engineering, V11, P317, DOI 10.1016/0167-9317(90)90122-A
- [9] Mold-assisted nanolithography: A process for reliable pattern replication [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 4124 - 4128
- [10] Harriott L. R., 1998, Materials Science in Semiconductor Processing, V1, P93, DOI 10.1016/S1369-8001(98)00019-5