Formation of H- on thin aluminum films

被引：13

作者：

Borisov, AG

Winter, H

机构：

[1] Institut für Physik, Humboldt-Universität zu Berlin, D-10115 Berlin

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1996年 / 115卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(96)01518-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We report on a theoretical study on the formation of negative hydrogen ions in the scattering from a thin aluminum film. in contrast to a semi-infinite metal electronic states of the film show pronounced effects of quantization along the direction of the surface normal. We predict that this quantization has specific effects on the formation of H--ions in the scattering from thin films.

引用

收藏

页码：142 / 145

页数：4

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