Two-dimensional photonic crystals produced by additive nanolithography with electron beam-induced deposition act as filters in the infrared

被引：41

作者：

Koops, HWP

Hoinkis, OE

Honsberg, MEW

Schmidt, R

Blum, R

Böttger, G

Kuligk, A

Liguda, C

Eich, M

机构：

[1] T Nova Innovat Gesell mbH, Technol Zentrum, D-64307 Darmstadt, Germany

[2] Tech Univ Hamburg, D-21071 Hamburg, Germany

来源：

MICROELECTRONIC ENGINEERING | 2001年 / 57-8卷

关键词：

additive nanolithography; electron beam induced deposition; photonic crystals; WDM-filter; nanocrystalline deposited material;

D O I：

10.1016/S0167-9317(01)00565-2

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 [电气工程]; 0809 [电子科学与技术];

摘要：

Three-dimensional additive nanolithography with electron beam-induced deposition is suited for rapid-prototyping of photonic crystals. It is used to construct rods of 3 mum in height from nanocrystalline material having an aspect ratio > 15. The deposited rods have an edge roughness of 2 nm. The refractive index of the nanocystalline material is 2.8. The placement accuracy is 11 nm. Mirrors, band-filters and various designs are generated. Optical characterisation shows the filter action, but light loss from the PMMA wave guide into the underlying SiO2-cladding so far limits the efficiency of the mirrors. (C) 2001 Published by Elsevier Science B.V.

引用

页码：995 / 1001

页数：7

共 16 条

[1]

BIRNER A, 1999, PHYSIKALISCHE BLAETT, V3, P27

[2]

Fast modeling of photonic bandgap structures by use of a diffraction-grating approach [J].