Molecular beam epitaxy system at an undergraduate institution

被引:9
作者
Celinski, Z [1 ]
机构
[1] Univ Colorado, Dept Phys, Colorado Springs, CO 80918 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2001年 / 19卷 / 01期
关键词
D O I
10.1116/1.1329116
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We describe a relatively inexpensive molecular beam epitaxy system built at our undergraduate institution to study novel magnetic structures. The system consists of two main chambers, growth and analysis, a sophisticated manipulator, and a loadlock chamber. It is pumped by a series of ion pumps (400, 140, 60, and 2 1/s), a cryopump, and a turbomolecular pump system that reach basic pressure of 10(-10)Torr. The 8 ports for K cells, surrounded by a nitrogen cryoshroud, and a multipocket e-gun allow us to evaporate 12 different materials onto a substrate 1 in, in diameter. The system is equipped with a series of analytical techniques, such as reflection high energy electron diffraction (RHEED), low energy electron diffraction, and Auger electron spectroscopy (AES). The total cost of our system is $160,000, excluding the RHEED gun, AES ' system, and about $50,000 worth of used parts that were available in our department. (C) 2001 American Vacuum Society.
引用
收藏
页码:383 / 385
页数:3
相关论文
共 2 条
[1]  
Anderson A.C., Rev. Sci. Instrum., 39, (1968)
[2]  
Takahira Y., Okamoto H., J. Cryst. Growth, 175-176, (1997)