Micromachined 2D nanoelectrospray emitter

被引：4

作者：

Arscott, S ^{[1
]}

Le Gac, S

Druon, C

Tabourier, P

Rolando, C

机构：

[1] CNRS, Inst Elect Microelect & Nanotechnol, UMR 8520, Villeneuve Dascq, France

[2] Univ Sci & Technol, Lab Chim Organ & Macromol, Villeneuve Dascq, France

来源：

ELECTRONICS LETTERS | 2003年 / 39卷 / 24期

关键词：

D O I：

10.1049/el:20031099

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A novel 2D nanoelectrospray emitter for mass spectrometry has been micromachined using photoresist SU-8 on silicon substrates using one-step photomasking. The design contains a reservoir, a capillary slot and an emitter tip. The emitters were successfully tested on an ion trap mass spectrometer. A nanoelectrospray was observed at voltages as low as 0.8 kV.

引用

页码：1702 / 1703

页数：2

共 6 条

[1]

Figeys D, 2001, ELECTROPHORESIS, V22, P208, DOI 10.1002/1522-2683(200101)22:2<208::AID-ELPS208>3.0.CO

[2]

2-O

[3] Development of micromachined hollow tips for protein analysis based on nanoelectrospray ionization mass spectrometry [J].

Griss, P ;

Melin, J ;

Sjödahl, J ;

Roeraade, J ;

Stemme, G .

JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2002, 12 (05) :682-687

[4]

KOCH M, 2000, MICROFLUIDIC TECHNOL, P151

[5] A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist [J].

Lin, CH ;

Lee, GB ;

Chang, BW ;

Chang, GL .

JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2002, 12 (05) :590-597

[6] Silicon-processed microneedles [J].

Lin, LW ;

Pisano, AP .

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1999, 8 (01) :78-84

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