A study of the low-temperature submonolayer deposition of Pb on Cu (100)

被引：10

作者：

Bocquet, F ^{[1
]}

Gauthier, S ^{[1
]}

机构：

[1] Univ Paris 07, Phys Solides Grp, UMR 7588 CNRS, F-75251 Paris 05, France

来源：

SURFACE SCIENCE | 1998年 / 416卷 / 1-2期

关键词：

copper; epitaxy; growth; lead; low index single crystal surfaces; metal-metal interfaces; Scanning Tunneling Microscopy; surface structure; morphology; roughness; topography;

D O I：

10.1016/S0039-6028(98)00382-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The surface structures formed by submonolayer deposition of lead on the (100) face of copper in the 160-220 K temperature range are investigated by Low-Energy Electron Diffraction (LEED) and Scanning Tunneling Microscopy (STM). The two ordered structures observed are modelled as checkerboard patterns of c(2 x 2) antiphase domains, in full agreement with the experimental data, but in contrast to previous propositions [W. Li. G. Vidali, Surf. Sci. 187-288 (1993) 955; W. Li. J.-S. Lin, M. Karimi, G. Vidali, J. Vac. Sci. Technol. A 9(3) (1991) 1707]. The morphology observed near 220 K is characterised by the development of monolayer high, fractal-like islands, which appear to grow unit cell by unit cell. This fractal growth behaviour disappears at lower temperature. (C) 1998 Published by Elsevier Science B.V. All rights reserved.

引用

页码：1 / 8

页数：8

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