Large-area magnetic metamaterials via compact interference lithography

被引：58

作者：

Feth, Nils

Enkrich, Christian

Wegener, Martin

Linden, Stefan

机构：

[1] Univ Karlsruhe, Inst Angew Phys, D-76128 Karlsruhe, Germany

[2] Univ Karlsruhe, DFG, CFN, D-76128 Karlsruhe, Germany

[3] Forschungszentrum Karlsruhe Helmholtz Gemeinsch, Inst Nanotechnol, D-76021 Karlsruhe, Germany

来源：

OPTICS EXPRESS | 2007年 / 15卷 / 02期

关键词：

D O I：

10.1364/OE.15.000501

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Magnetic metamaterials with magnetic-dipole resonances around 1.2-mu m wavelength are fabricated using an extremely compact and robust version of two- or three-beam interference lithography for 1D and 2D structures, respectively. Our approach employs a single laser beam at 532-nm wavelength impinging onto a suitably shaped dielectric object ( roof-top prism or pyramid) - bringing the complexity of fabricating magnetic metamaterials down to that of evaporating usual dielectric/metallic coatings. The measured optical spectra agree well with theory; the retrieval reveals a negative magnetic permeability. Importantly, the large-scale sample homogeneity is explicitly demonstrated by optical experiments. (c) 2007 Optical Society of America.

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页码：501 / 507

页数：7

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