Epitaxial growth of CoO films on semiconductor and metal substrates by constructing a complex heterostructure

被引:3
作者
Entani, S
Kiguchi, M
Saiki, K
Koma, A
机构
[1] Univ Tokyo, Grad Sch Frontier Sci, Dept Complex Sci & Engn, Bunkyo Ku, Tokyo 1130033, Japan
[2] Univ Tokyo, Grad Sch Sci, Dept Chem, Bunkyo Ku, Tokyo 1130033, Japan
关键词
reflection high-energy electron diffraction; molecular beam epitaxy; halides; oxides;
D O I
10.1016/S0022-0248(02)01905-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Epitaxial growth of CoO films was studied using reflection high-energy electron diffraction (RHEED), electron energy loss spectroscopy (EELS), ultraviolet photoelectron spectroscopy (UPS) and Auger electron spectroscopy (AES). The RHEED results indicated that an epitaxial CoO film grew on semiconductor and metal substrates (CoO (001)parallel toGaAs (001), Cu (001), Ag (001) and [100]CoOparallel to[100] substrates) by constructing a complex heterostructure with two alkali halide buffer layers. The AES, EELS and UPS results showed that the grown CoO film had almost the same electronic structure as bulk CoO. We could show that use of alkali halide buffer layers was a good way to grow metal oxide films on semiconductor and metal substrates in an O-2 atmosphere. Tile alkali halide layers not only works as glue to connect very dissimilar materials but also prevents oxidation of metal and semiconductor substrates, (C) 2002 Elsevier Science B.V. All rights reserved.
引用
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页码:110 / 118
页数:9
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