Optical properties of silicon pigmented alumina films

被引:9
作者
Tesfamichael, T
Vargas, WE
Wackelgard, E
Niklasson, GA
机构
[1] Solid State Physics, Department of Materials Science, Uppsala University
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.365668
中图分类号
O59 [应用物理学];
学科分类号
摘要
Plates of Al-Si alloy were anodized in a sulfuric acid solution. This treatment provides a Si-Al2O3 coating growing at a rate of 0.14 mu m/min. The Si particles had sizes between 1 and 10 mu m, as seen by scanning electron microscopy. Optical measurements showed a continuous decrease of reflectance with increasing film thickness. The reflectance of the Si-Al2O3 coated aluminum could be understood from a four flux radiative transfer theory, In order to explain our measurements, it was found necessary to include a free-carrier term in the dielectric permittivity of Si. The free carriers are probably due to doping with Al. Hence, the relaxation time of the free carriers is determined by scattering from the charged Al impurities. (C) 1997 American Institute of Physics.
引用
收藏
页码:3508 / 3513
页数:6
相关论文
共 31 条
[1]   NICKEL PIGMENTED ANODIC ALUMINUM-OXIDE FOR SELECTIVE ABSORPTION OF SOLAR-ENERGY [J].
ANDERSSON, A ;
HUNDERI, O ;
GRANQVIST, CG .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) :754-764
[2]   LIGHT-SCATTERING BY A SPHEROIDAL PARTICLE [J].
ASANO, S ;
YAMAMOTO, G .
APPLIED OPTICS, 1975, 14 (01) :29-49
[3]  
Bohren CF., 2008, ABSORPTION SCATTERIN
[4]   MIE SCATTERING INTO BACKWARD HEMISPHERE [J].
CHYLEK, P .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1973, 63 (11) :1467-1471
[5]  
CONWELL E, 1959, PHYS REV, V77, P388
[6]  
Cote J., 1970, PLATING, V57, P484
[7]   ELECTRICAL PROPERTIES OF N-TYPE GERMANIUM [J].
DEBYE, PP ;
CONWELL, EM .
PHYSICAL REVIEW, 1954, 93 (04) :693-706
[8]  
Edwards D. F., 1985, HDB OPTICAL CONSTANT, V1, P547
[9]   INFRARED OPTICAL-PROPERTIES OF EVAPORATED ALUMINA FILMS [J].
ERIKSSON, TS ;
HJORTSBERG, A ;
NIKLASSON, GA ;
GRANQVIST, CG .
APPLIED OPTICS, 1981, 20 (15) :2742-2746