Diffusion of hydrogen in crystalline silicon

被引:17
作者
Bédard, S
Lewis, LJ
机构
[1] Univ Montreal, Dept Phys, Montreal, PQ H3C 3J7, Canada
[2] Univ Montreal, Grp Rech Phys & Technol Couches Minces, Montreal, PQ H3C 3J7, Canada
来源
PHYSICAL REVIEW B | 2000年 / 61卷 / 15期
关键词
D O I
10.1103/PhysRevB.61.9895
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The coefficient of diffusion of hydrogen in crystalline silicon is calculated using tight-binding molecular dynamics. Our results are in good quantitative agreement with a? earlier study by Panzarini and Colombo [Phys. Rev. Lett. 73, 1636 (1994)]. However, while our calculations indicate that long jumps dominate over single hops at high temperatures, no abrupt change in the diffusion coefficient can be observed with decreasing temperature. The (classical) Arrhenius diffusion parameters, as a consequence, should extrapolate to low temperatures.
引用
收藏
页码:9895 / 9898
页数:4
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