MOCVD of antimony oxides for gas sensor applications
被引:11
作者:
Haycock, PW
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机构:
Univ Keele, Sch Chem & Phys, Lennard Jones Labs, Birchall Ctr Inorgan Chem & Mat Sci, Keele ST5 5BG, Staffs, EnglandUniv Keele, Sch Chem & Phys, Lennard Jones Labs, Birchall Ctr Inorgan Chem & Mat Sci, Keele ST5 5BG, Staffs, England
Haycock, PW
[1
]
Horley, GA
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机构:Univ Keele, Sch Chem & Phys, Lennard Jones Labs, Birchall Ctr Inorgan Chem & Mat Sci, Keele ST5 5BG, Staffs, England
Horley, GA
Molloy, KC
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机构:Univ Keele, Sch Chem & Phys, Lennard Jones Labs, Birchall Ctr Inorgan Chem & Mat Sci, Keele ST5 5BG, Staffs, England
Molloy, KC
Myers, CP
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机构:Univ Keele, Sch Chem & Phys, Lennard Jones Labs, Birchall Ctr Inorgan Chem & Mat Sci, Keele ST5 5BG, Staffs, England
Myers, CP
Rushworth, SA
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机构:Univ Keele, Sch Chem & Phys, Lennard Jones Labs, Birchall Ctr Inorgan Chem & Mat Sci, Keele ST5 5BG, Staffs, England
Rushworth, SA
Smith, LM
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机构:Univ Keele, Sch Chem & Phys, Lennard Jones Labs, Birchall Ctr Inorgan Chem & Mat Sci, Keele ST5 5BG, Staffs, England
Smith, LM
机构:
[1] Univ Keele, Sch Chem & Phys, Lennard Jones Labs, Birchall Ctr Inorgan Chem & Mat Sci, Keele ST5 5BG, Staffs, England
[2] Univ Bath, Dept Chem, Bath BA2 7AY, Avon, England
[3] Epichem Ltd, Wirral CH62 3QF, Merseyside, England
来源:
JOURNAL DE PHYSIQUE IV
|
2001年
/
11卷
/
PR3期
关键词:
D O I:
10.1051/jp4:20013131
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
Thin films of Sb2O3 (senarmonite) have been grown by MOCVD from ((BUO)-B-n)(3)Sb in the temperature range 500 - 550 degreesC without addition of a separate oxygen source. In addition, films of Sb6O13 have been deposited at 600 degreesC using (EtO)(3)Sb as the precursor; this latter process is enhanced by the addition of O-2. Preliminary gas sensor trials using the senarmontite films have shown them to have a very high electrical resistance. They exhibit a rapid response to methane and full recovery once the methane is removed.
机构:
Univ Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, ArgentinaUniv Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, Argentina
Blaustein, G
;
Castro, MS
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机构:
Univ Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, ArgentinaUniv Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, Argentina
Castro, MS
;
Aldao, CM
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机构:
Univ Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, ArgentinaUniv Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, Argentina
机构:
Univ Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, ArgentinaUniv Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, Argentina
Blaustein, G
;
Castro, MS
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h-index: 0
机构:
Univ Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, ArgentinaUniv Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, Argentina
Castro, MS
;
Aldao, CM
论文数: 0引用数: 0
h-index: 0
机构:
Univ Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, ArgentinaUniv Mar del Plata, Inst Mat Sci & Technol, RA-7600 Mar Del Plata, Argentina