Modifications of the electronic structure of Ni/Cu(001) as a function of the film thickness

被引:60
作者
Srivastava, P [1 ]
Haack, N [1 ]
Wende, H [1 ]
Chauvistre, R [1 ]
Baberschke, K [1 ]
机构
[1] UNIV RAJASTHAN, DEPT PHYS, JAIPUR 302004, RAJASTHAN, INDIA
关键词
D O I
10.1103/PhysRevB.56.R4398
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report angle-dependent near-edge x-ray-absorption fine-structure measurements of tetragonal Ni films [0.6-14.4 monolayers (ML)] grown on a Cu(001) surface. The analysis of the Ni L-3.2 white-line intensities show that the density of 3d holes (n(h)) increases almost by 20% from a submonolayer to a 5 ML thick film, clearly showing that a constant value of n(h) cannot be used in sum rules to estimate spin and orbital momentum contributions to the local magnetic moment by magnetic circular dichroism, Therefore, caution must be exercised before claiming an enhancement of spin and orbital magnetic moment at lower film coverages. Also, a difference in the number of d holes having in-and out-of-plane symmetries and modifications in the near-edge features was observed.
引用
收藏
页码:R4398 / R4401
页数:4
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