anode film;
tin oxide;
surface roughness;
cut-off voltage;
microbattery;
silicon-doping;
D O I:
10.1016/S0378-7753(01)00764-9
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
Thin-film SnO2 and Si-doped SnO2 microbattery anodes are deposited on a Mo/Si substrate by e-beam evaporator at room temperature. The deposited film are characterized by energy dispersion X-ray spectroscopy (EDS), X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM) atomic force microscopy (AFM), and transmission electron microscopy (TEM). Constant-current galvanostatic charge-discharge tests of half cells are performed. Both the SnO2 film Consist of short-range ordered small grains (nano-scale) and exhibit good ability to and extract Li+ ions. Electrochemical cycling performance is dependent on the cut-off voltage. Tin oxide film anodes which are cycled in the voltage range 0.1-0.8 V show the highest reversible capacity (302 muA h/cm(2) mum for Si-doped film; 200 muA h/cm(2) mum for pure SnO2 film) and the longest cycle-life. Its a papers that Si plays an important role as a glass former element in the Li-Si-O network by suppressing the growth of Sn grains, reducing the surface roughness, and enhancing film adhesion. Thus, Si-doped films are strong candidates for microbattery anodes with improved electrochemical cycling performance. (C) 2001 Elsevier Science B.V. All rights reserved.
机构:
Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South KoreaHanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Lee, WH
;
Son, HC
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Son, HC
;
Moon, HS
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Moon, HS
;
Kim, YI
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Kim, YI
;
Sung, SH
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Sung, SH
;
Kim, JY
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Kim, JY
;
Lee, JG
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Lee, JG
;
Park, JW
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
机构:
Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South KoreaHanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Lee, WH
;
Son, HC
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Son, HC
;
Moon, HS
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Moon, HS
;
Kim, YI
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Kim, YI
;
Sung, SH
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Sung, SH
;
Kim, JY
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Kim, JY
;
Lee, JG
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea
Lee, JG
;
Park, JW
论文数: 0引用数: 0
h-index: 0
机构:Hanyang Univ, Dept Met Engn, Thin Film Lab M313, Seoul 133791, South Korea