A method to characterize overlay tool misalignments and distortions

被引:3
作者
Silver, RM
Potzick, J
Scire, F
Evans, C
McGlauflin, M
Kornegay, E
Larrabee, R
机构
来源
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XI | 1997年 / 3050卷
关键词
D O I
10.1117/12.275965
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new optical alignment artifact under development fit NIST is described. This artifact, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. We outline the design criteria and diamond turning lathe techniques used for manufacturing this structure. The alignment methods using this artifact allow the separation of error components associated with the optical system or the mechanical positioning systems as encountered when performing measurements in different focal planes. Although some difficulties have been encountered in the actual diamond turning process, the data presented show some improvements with the more recent prototypes which indicate that this method of fabrication will be useful. Photometer scan data and CCD image acquisition hardware show a significant optical response at the step edges from these structures. Initial analysis of the optical response of these edges shows sensitivity to the material used and the details of the manufacturing processes.
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页码:143 / 155
页数:13
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