Local electric field enhancement during nanofocusing of plasmons by a tapered gap

被引:82
作者
Gramotnev, Dmitri K.
Pile, David F. P.
Vogel, Michael W.
Zhang, Xiang
机构
[1] Queensland Univ Technol, Appl Opt Program, Sch Phys & Chem Sci, Brisbane, Qld 4001, Australia
[2] Univ Calif Berkeley, NSF, NSEC, Berkeley, CA 94720 USA
关键词
D O I
10.1103/PhysRevB.75.035431
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We demonstrate that during plasmon nanofocusing in a tapered gap (V groove), local electric field experiences much stronger enhancement than the magnetic field. Two distinct asymptotic regimes are found near the tip of the groove: The electric field approaches either zero or infinity when dissipation is above or below a critical level (at a fixed taper angle), or taper angle is smaller or larger than a critical angle (at a fixed level of dissipation). Tapered gaps are shown to be the best option for achieving maximal field enhancement, compared to nanowedges and tapered rods. An optimal taper angle is determined.
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页数:5
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