High thermal stability of cross-linked aromatic self-assembled monolayers:: Nanopatterning via selective thermal desorption

被引:68
作者
Turchanin, A. [1 ]
El-Desawy, M. [1 ]
Goelzhaeuser, A. [1 ]
机构
[1] Univ Bielefeld, D-33615 Bielefeld, Germany
关键词
D O I
10.1063/1.2437091
中图分类号
O59 [应用物理学];
学科分类号
摘要
An extremely high thermal stability of electron cross-linked biphenyl self-assembled monolayers (SAMs) is reported. The authors found that pristine biphenylthiol SAMs desorb at similar to 400 K from gold surfaces, which is induced by a breaking of C-S bonds. Despite of a similar bond cleavage in cross-linked SAMs, these remain on the surface up to 1000 K, which is the highest temperature reported for a SAM. When patterns of pristine and cross-linked SAMs are heated, the pristine regions desorb, and the cross-linked regions remain on the surface. The authors show that this thermal desorption lithography can be utilized for the fabrication of molecular surface nanostructures.
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页数:3
相关论文
共 22 条
[1]  
[Anonymous], 2003, NIST XRAY PHOT SPECT
[2]   FORMATION OF MONOLAYER FILMS BY THE SPONTANEOUS ASSEMBLY OF ORGANIC THIOLS FROM SOLUTION ONTO GOLD [J].
BAIN, CD ;
TROUGHTON, EB ;
TAO, YT ;
EVALL, J ;
WHITESIDES, GM ;
NUZZO, RG .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1989, 111 (01) :321-335
[3]  
BRIGGS D, 2003, SURFACE ANAL AUGER X, P397
[4]   X-ray photoelectron spectroscopy sulfur 2p study of organic thiol and disulfide binding interactions with gold surfaces [J].
Castner, DG ;
Hinds, K ;
Grainger, DW .
LANGMUIR, 1996, 12 (21) :5083-5086
[5]   Self-assembled monolayers stabilized by three-dimensional networks of hydrogen bonds [J].
Clegg, RS ;
Reed, SM ;
Hutchison, JE .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1998, 120 (10) :2486-2487
[6]   Freestanding nanosheets from crosslinked biphenyl self-assembled monolayers [J].
Eck, W ;
Küller, A ;
Grunze, M ;
Völkel, B ;
Gölzhäuser, A .
ADVANCED MATERIALS, 2005, 17 (21) :2583-+
[7]  
ELDESAWY M, UNPUB
[8]   Electron-induced crosslinking of aromatic self-assembled monolayers:: Negative resists for nanolithography [J].
Geyer, W ;
Stadler, V ;
Eck, W ;
Zharnikov, M ;
Gölzhäuser, A ;
Grunze, M .
APPLIED PHYSICS LETTERS, 1999, 75 (16) :2401-2403
[9]   GROWTH OF PYROMELLITIC DIANHYDRIDE ON AN AMINO-TERMINATED SURFACE [J].
GOLZHAUSER, A ;
PANOV, S ;
MAST, M ;
SCHERTEL, A ;
GRUNZE, M ;
WOLL, C .
SURFACE SCIENCE, 1995, 334 (1-3) :235-247
[10]   Adsorption of alkanethiols and biphenylthiols on Au and Ag substrates: A high-resolution X-ray photoelectron spectroscopy study [J].
Heister, K ;
Zharnikov, M ;
Grunze, M ;
Johansson, LSO .
JOURNAL OF PHYSICAL CHEMISTRY B, 2001, 105 (19) :4058-4061