Spontaneous buildup of giant surface potential by vacuum deposition of Alq3 and its removal by visible light irradiation

被引:176
作者
Ito, E
Washizu, Y
Hayashi, N
Ishii, H
Matsuie, N
Tsuboi, K
Ouchi, Y
Harima, Y
Yamashita, K
Seki, K
机构
[1] Nagoya Univ, Venture Business Lab, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[2] Nagoya Univ, Grad Sch Sci, Dept Chem, Chikusa Ku, Nagoya, Aichi 4648602, Japan
[3] Hiroshima Univ, Fac Integrated Arts & Sci, Higashihiroshima 7398521, Japan
[4] Nagoya Univ, Res Ctr Mat Sci, Chikusa Ku, Nagoya, Aichi 4648602, Japan
关键词
D O I
10.1063/1.1518759
中图分类号
O59 [应用物理学];
学科分类号
摘要
We observed high and persistent spontaneous buildup of the surface potential (SP) upon vacuum deposition of tris(8-hydroxyquinolinato) aluminum(III) (Alq(3)) on an Au substrate under dark conditions. SP determined by the Kelvin probe method reached 28 V at a thickness of 560 nm and the surface of the Alq(3) film was positively charged. We propose a model in which preferential orientation of the dipole moments of Alq(3) molecules is the origin of this buildup of the SP. The intensity of second-harmonic generation was also dramatically increased by the deposition of Alq(3) under dark conditions, which supports the notion of a buildup of dipole layers. This giant surface potential was almost completely removed by irradiation of Alq(3) molecules with visible light, and irradiation during deposition also prevented the buildup of SP. (C) 2002 American Institute of Physics.
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页码:7306 / 7310
页数:5
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