Application of infrared microscopy to thermal diffusivity measurement in refractories at various temperatures

被引:13
作者
Bisson, JF [1 ]
Fournier, D [1 ]
机构
[1] Univ Paris 06, Ecole Super Phys & Chim Ind, Lab Instrumentat, CNRS,UPR A 0005, F-75005 Paris, France
关键词
D O I
10.1068/htec547
中图分类号
O414.1 [热力学];
学科分类号
摘要
An infrared microscope coupled with a mercury cadmium telluride detector is used to measure thermal diffusivity in refractory materials with a 100 mu m spatial resolution. Experimental data obtained on a pure titanium sample are compared with reference values. The agreement is good within 15% at ambient temperature and is better than +/-10% at temperatures higher than 300 degrees C. This setup was applied to a refractory used for glass manufacturing. Local diffusivity variations, consistent with the morphology and composition of the sample, are detected with a resolution better than 100 mu m.
引用
收藏
页码:205 / 210
页数:6
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