Luminescent properties of ZnO thin films grown epitaxially on Si substrate

被引:59
作者
Miyake, A
Kominami, H
Tatsuoka, H
Kuwabara, H
Nakanishi, Y
Hatanaka, Y
机构
[1] Shizuoka Univ, Elect Res Inst, Hamamatsu, Shizuoka 4328011, Japan
[2] Shizuoka Univ, Grad Sch Elect Sci & Technol, Hamamatsu, Shizuoka 4328011, Japan
[3] Shizuoka Univ, Fac Engn, Hamamatsu, Shizuoka 4328561, Japan
关键词
ZnO; epitaxial growth; exciton; PL; thin film; RHEED;
D O I
10.1016/S0022-0248(00)00095-6
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
ZnO thin films were grown on Si(1 1 1)substrates by employing an epitaxial ZnS thin film as a buffer layer. The structural and luminescent properties of the ZnO thin films have been investigated in view of the application to opto-electronic devices due to near-ultraviolet emission by exciton the binding energy of which is about 60 meV. When the epitaxial ZnS buffer layer was grown on the Sil(1 1 1) substrate at a substrate temperature of 200 degrees C by electron beam evaporation, the epitaxial ZnO film was successfully grown on the ZnS/Si(1 1 1) layer with the orientation of (0 0 0 2), [1 1 (2) over bar 0]ZnO parallel to (1 1 1), [1 (1) over bar 0]Zns parallel to (1 1 1), [1 (1) over bar 0]Si(1 1 1) at a substrate temperature of 400 degrees C. An excitonic emission with a peak at 3.35 eV at 20 K was successfully obtained by exciting at 315 nm of He-Cd laser. (C) 2000 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:294 / 298
页数:5
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