Diamond-like carbon films deposited in the plasma of dielectric barrier discharge at atmospheric pressure

被引：15

作者：

Liu, DP

Yu, SJ

Ma, TC

Song, ZM

Yang, XF

机构：

[1] Dalian Univ Technol, Lab Plasma Phys Chem, Dalian 116024, Peoples R China

[2] Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 6A期

关键词：

diamond-like films; dielectric barrier discharge; plasma deposition; Infrared spectroscopy; film hardness;

D O I：

10.1143/JJAP.39.3359

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Dielectric barrier discharge at atmospheric pressure has been applied to prepare diamond-like hydrogenated amorphous carbon films on glass and silicon substrates from CH4-H-2 mixtures. The coating with Knoop hardness up to 10GPa can be deposited under CH4-to-H-2 ratio Of 1 : 2 and substrate temperature of 300 degrees C. The IR absorption analysis of the coating shows, that its hydrocarbon group ratio [CH3/(CH2+CH)] and C-C bond type ratio (sp(3)C/sp(2)C for CH and CH2 groups) are 20% : 80% and 15 : 1, respectively.

引用

页码：3359 / 3360

页数：2

共 5 条

[1] a-C:H films deposited in the plasma of barrier and surface discharges at atmospheric pressure [J].