Fabrication and optical characterization of a TiO2 thin film on a silica microsphere

被引:25
作者
Haraguchi, M
Komatsu, F
Tajiri, K
Okamoto, T
Fukui, M
Kato, S
机构
[1] Univ Tokushima, Fac Engn, Dept Opt Sci & Technol, Tokushima 7708506, Japan
[2] Photo Catalyt Mat Inc, Aichi 4850011, Japan
关键词
silicon oxides; titanium oxide; scanning electron microscopy (SEM); raman scattering spectroscopy; reflection spectroscopy; coatings;
D O I
10.1016/j.susc.2003.10.037
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 [物理化学]; 081704 [应用化学];
摘要
We have fabricated a uniform TiO2 thin film on a silica microsphere by using the so-called sol-gel reaction. Characterization of the TiO2 thin film was carried out by scanning electron microscopy, Raman scattering, and the attenuated-total-reflection (ATR) method. We have observed optical resonances of microspheres with and without the TiO2 thin film by using the ATR method, which allowed us to evaluate optically the thickness and the refractive index of the TiO2 thin film from the resonance due to excited whispering gallery modes, which are resonance modes inherent of microspheres. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:59 / 66
页数:8
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