Effects of Pt and Ta addition on compositional microstructure of CoCr-alloy thin film media

被引:21
作者
Inaba, N [1 ]
Futamoto, M [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Tokyo 1858601, Japan
关键词
D O I
10.1063/1.372867
中图分类号
O59 [应用物理学];
学科分类号
摘要
Compositional segregation structures of Co-Cr-Ta, Co-Cr-Pt, and Co-Cr-Pt-Ta thin film media with Cr concentrations of about 15 at. % were studied using an analytical transmission electron microscope. Cr atoms in the CoCrTa specimen are extremely localized around the grain boundaries with a maximum concentration of about 23 at. % with a width of 1 nm, while that inside the grain is about a half of the average composition. The Co-Cr-Pt specimen shows Cr segregation at grain boundaries with a maximum concentration by 4 at. % greater than the average composition. The Cr concentration inside the grain is kept nearly same with the average concentration. The Co-Cr-Pt-Ta specimen shows a degree of Cr segregation between the Co-Cr-Ta and the Co-Cr-Pt systems. The Cr enrichment at bicrystal grain boundaries is broader and weaker than those at the normal grain boundaries. (C) 2000 American Institute of Physics. [S0021-8979(00)69708-6].
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收藏
页码:6863 / 6865
页数:3
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