Geometry projection method for optimizing photonic nanostructures

被引:34
作者
Frei, W. R. [1 ]
Tortorelli, D. A. [1 ]
Johnson, H. T. [1 ]
机构
[1] Univ Illinois, Dept Mech Sci & Engn, Urbana, IL 61801 USA
关键词
D O I
10.1364/OL.32.000077
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A geometry projection method for the design of photonic nanostructures is demonstrated and compared with a topology optimization method. By using a higher-dimensional surface to delineate the material interfaces, the projection method restricts the regions of intermediate dielectric properties to a narrow user-defined band and gives some implicit control over feature size. Topology optimization addresses these issues by using a penalization to avoid areas of intermediate dielectric and a filter to obtain implicit control over feature size. The directional emission from a photonic crystal waveguide termination is improved by both methods by generating a series of irregularly shaped dielectric posts. Results are presented, and the relative merits of each method are discussed. (c) 2006 Optical Society of America
引用
收藏
页码:77 / 79
页数:3
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