Nitriding of titanium by NH3 RF plasma:: a study of the corrosion resistance and the mechanical properties of the protective films formed at the solid surface

被引:9
作者
Bellakhal, N
机构
[1] INSAT, Dept Chim & Biol Appliquees, Tunis 1080, Tunisia
[2] UFR Sci & Tech, LEICA, F-76821 Mont St Aignan, France
关键词
metal; thin films; electrochemical measurements; X-ray diffraction;
D O I
10.1016/S0025-5408(01)00709-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The exposure of a,titanium sample to an NH3 low pressure plasma leads to the formation of a nitriding layer. The products formed at the titanium surface were identified by XRD spectroscopy. The modification of the corrosion resistance characteristics of titanium due to the NH3 plasma treatment were investigated by electrochemical tests. The recorded polarization curves of the treated titanium samples were used to determine the values of the corrosion potential E-corr This study confirms the increasing of the corrosion resistance as a function of the time exposure and the injected electric power in the silica reactor. The plasma treatment also induces drastic changes of the titanium target in hardness. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:2539 / 2546
页数:8
相关论文
共 16 条
[1]   Copper oxides formation by a low pressure RF oxygen plasma [J].
Bellakhal, N ;
Draou, K ;
Cheron, BG ;
Brisset, JL .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1996, 41 (02) :206-216
[2]   Electrochemical investigation of copper oxide films formed by oxygen plasma treatment [J].
Bellakhal, N ;
Draou, K ;
Brisset, JL .
JOURNAL OF APPLIED ELECTROCHEMISTRY, 1997, 27 (04) :414-421
[3]   THE INFLUENCE OF NITROGEN AND MOLYBDENUM ON THE SENSITIZATION PROPERTIES OF LOW-CARBON AUSTENITIC STAINLESS-STEELS [J].
BENEKE, R ;
SANDENBERGH, RF .
CORROSION SCIENCE, 1989, 29 (05) :543-&
[4]  
BRISSET JL, 1990, ANALUSS, V26, P185
[5]   Effect of nitrogen on the electrochemical behavior of 301LN stainless steel in H2SO4 solutions [J].
Chou, SL ;
Tsai, MJ ;
Tsai, WT ;
Lee, JT .
MATERIALS CHEMISTRY AND PHYSICS, 1997, 51 (02) :97-101
[6]  
d'Agostino R., 1981, Plasma Chem. Plasma Process, V1, P19, DOI [10.1007/BF00566373, DOI 10.1007/BF00566373]
[7]   Plasma elaboration of barrier layers: A study of the oxides formed at the surface of brass (90Cu10Zn) by RF electric discharges in oxygen [J].
Draou, K ;
Bellakhal, N ;
Cheron, BG ;
Brisset, JL .
MATERIALS RESEARCH BULLETIN, 1998, 33 (07) :1117-1128
[8]  
FAVIA P, 1996, PLASMAS POLYM, V1, P91, DOI DOI 10.1007/BF02532821
[9]   CHEMICAL VAPOR-DEPOSITION OF TITANIUM, ZIRCONIUM, AND HAFNIUM NITRIDE THIN-FILMS [J].
FIX, R ;
GORDON, RG ;
HOFFMAN, DM .
CHEMISTRY OF MATERIALS, 1991, 3 (06) :1138-1148
[10]  
GICQUEL A, 1985, P 7 INT S PLASM CHEM, V2, P418