Tunable optical filter of porous silicon as key component for a MEMS spectrometer

被引:60
作者
Lammel, G [1 ]
Schweizer, S
Schiesser, S
Renaud, P
机构
[1] Robert Bosch GmbH, D-76762 Reutlingen, Germany
[2] Palo Alto Res Ctr, EML, Palo Alto, CA 94304 USA
[3] Swiss Fed Inst Technol, EPFL, Inst Microsyst, IMS,Dept Microtechnol DMT, CH-1015 Lausanne, Switzerland
关键词
electropolishing; gas sensing; infrared; microspectrometer; porous silicon; surface micromachining; tunable optical filter;
D O I
10.1109/JMEMS.2002.803278
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a microspectrometer based on a tunable interference filter for infrared or visible light that scans the desired part of the spectrum within milliseconds. A single pixel detector measures serially the intensity at selected wavelengths. This concept avoids expensive linear detectors as used for grating spectrometers. The tunable filter is fabricated by a new porous silicon technology using only two photolithography steps. A Bragg mirror or a Fabry-Perot bandpass filter for transmission wavelengths between 400 nm and 8 mum at normal incidence is created by modulations of the refractive index in the filter plate. Two thermal bimorph micro-actuators tilt the plate by up to 90degrees, changing the incidence angle of the beam to be analyzed. This tunes the wavelength transmitted to the detector by a factor of 1.16. The filter area can be chosen between 0.27 x 0.70 mm(2) and 2.50 x 3.00 mm(2), the filter thickness is typically 30 mum. The spectral resolution of Deltalambda/lambda = 1/25 is sufficient for most sensor applications, e.g., measurement Of CO2 and CO in combustion processes by their IR absorption bands as will be presented.
引用
收藏
页码:815 / 828
页数:14
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