TiNxOyFz as a stable photocatalyst for water oxidation in visible light (<570 nm)

被引：127

作者：

Nukumizu, K

Nunoshige, J

Takata, T

Kondo, JN

Hara, M

Kobayashi, H

Domen, K

机构：

[1] Tokyo Inst Technol, Chem Resources Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

[2] Kurashiki Univ Sci & Arts, Coll Sci & Ind Technol, Dept Chem Technol, Kurashiki, Okayama 7128505, Japan

[3] Japan Sci & Technol, Core Res Evolut Sci & Technol, Taito Ku, Tokyo 1100015, Japan

来源：

CHEMISTRY LETTERS | 2003年 / 32卷 / 02期

关键词：

D O I：

10.1246/cl.2003.196

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

TiNxOyFz prepared from (NH4)(2)TiF6 and SiO2 under NH3 flow at 773 K has a bandgap-absorption edge at about 570 nm and functions as a stable photocatalyst for water oxidation.

引用

页码：196 / 197

页数：2

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TiNxOyFz as a stable photocatalyst for water oxidation in visible light (&lt;570 nm)

TiNxOyFz as a stable photocatalyst for water oxidation in visible light (<570 nm)