Pressure-dependent electrical resistivity in UCu5-xPdx

被引：3

作者：

Chau, R

Han, SH

Maple, MB

Aronson, MC

vonLohneysen, H

机构：

[1] UNIV CALIF SAN DIEGO,INST PURE & APPL PHYS SCI,LA JOLLA,CA 92093

[2] UNIV MICHIGAN,HARRISON M RANDALL LAB PHYS,ANN ARBOR,MI 48109

[3] UNIV KARLSRUHE,INST PHYS,D-76128 KARLSRUHE,GERMANY

来源：

PHYSICA B | 1997年 / 230卷

基金：

美国国家科学基金会;

关键词：

UCu5-xPdx; non-Fermi liquid system; pressure dependence; resistivity;

D O I：

10.1016/S0921-4526(96)00758-2

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Electrical resistivity rho(T) measurements under hydrostatic pressure on UCu4Pd and UCu3.5Pd1.5 are reported. The magnitude of rho(T) increases monotonically with increasing pressure. With increasing pressure, deviations from a linear T-dependence appear and the scaling temperature (Kondo temperature) increases monotonically.

引用

页码：600 / 602

页数：3

共 3 条

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[3] NON FERMI-LIQUID GROUND-STATES IN STRONGLY CORRELATED F-ELECTRON MATERIALS [J].

MAPLE, MB ;

DEANDRADE, MC ;

HERRMANN, J ;

DALICHAOUCH, Y ;

GAJEWSKI, DA ;

SEAMAN, CL ;

CHAU, R ;

MOVSHOVICH, R ;

ARONSON, MC ;

OSBORN, R .

JOURNAL OF LOW TEMPERATURE PHYSICS, 1995, 99 (3-4) :223-249

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