Electrical testing of gold nanostructures by conducting atomic force microscopy

被引:42
作者
Bietsch, A [1 ]
Schneider, MA
Welland, ME
Michel, B
机构
[1] IBM Corp, Zurich Res Lab, Res, CH-8803 Ruschlikon, Switzerland
[2] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 03期
关键词
D O I
10.1116/1.591353
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We devised a method for the reliable electrical testing of nanoscale wire arrays using conducting probe atomic force microscopy (AFM) in ambient conditions. A key requirement of this approach is the formation of highly reproducible electrical contacts between the conducting tip and the sample. We discuss the basic mechanical and electrical criteria of nanocontacts and derive a force-controlled protocol for the formation of low-ohmic contacts. Tips sputter coated with platinum provided the mechanical stability for both tapping-mode imaging and the formation of low-ohmic contacts on gold samples. Nanostructures on the sample were identified by topographic imaging and subsequently probed using the AFM tip as a mobile electrode. We measured resistivities in arrays of nanowires or local potentials of wires within electrical circuits, and detected electrical failures, thermal gradients, and small geometrical variations. The ability of this instrument to address electrical characteristics with high spatial resolution makes it a powerful tool fur lithography developments and on-chip monitoring of nanoscale circuits. (C) 2000 American Vacuum Society. [S0734-211X(00)03103-6].
引用
收藏
页码:1160 / 1170
页数:11
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