Contrast enhancement behavior of hydrogen silsesquioxane in a salty developer

被引：27

作者：

Nam, Sung-Wook ^{[1
]}

Rooks, Michael J. ^{[2
]}

Yang, Joel K. W. ^{[3
]}

Berggren, Karl K. ^{[3
]}

Kim, Hyun-Mi ^{[1
]}

Lee, Min-Hyun ^{[1
]}

Kim, Ki-Bum ^{[1
]}

Sim, Jae Hwan ^{[4
]}

Yoon, Do Yeung ^{[4
]}

机构：

[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151742, South Korea

[2] Yale Inst Nanosci & Quantum Engn, New Haven, CT 06520 USA

[3] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA

[4] Seoul Natl Univ, Dept Chem, Seoul 151742, South Korea

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2009年 / 27卷 / 06期

关键词：

electron resists; hydrogen compounds; sodium compounds; ELECTRON-BEAM RESIST; LITHOGRAPHY;

D O I：

10.1116/1.3245991

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The authors investigated a contrast enhancement behavior of hydrogen silsesquioxane (HSQ) in a salty development system (NaOH/NaCl). Time-resolved analysis of contrast curves and line-grating patterns were carried out to investigate the unique properties of a salty development process. In NaOH developer without salt, the development process was saturated beyond a certain development time. On the other hand, the addition of salt enabled a continuous development, which was not observed in the pure NaOH development. The continuous thinning process enhances the contrast of HSQ in the salty developer, which allows a fast collapsing behavior in HSQ line-grating patterns. During development process, salt seems to have the role of modifying HSQ by breaking network bonds preferentially, leading to a continuous development rate.

引用

页码：2635 / 2639

页数：5

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