Preparation of high quality ITO films on a plastic substrate using RF magnetron sputtering

被引：63

作者：

Kim, Dong-Ho ^{[1
]}

Park, Mi-Rang ^{[1
]}

Lee, Gun-Hwan ^{[1
]}

机构：

[1] KIMM, Surface Technol Res Ctr, Chang Won 641010, Kyungnam, South Korea

来源：

SURFACE & COATINGS TECHNOLOGY | 2006年 / 201卷 / 3-4期

关键词：

ITO; plastic substrate; sputtering; electrical transport properties; microstructure;

D O I：

10.1016/j.surfcoat.2006.01.004

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Indium tin oxide (ITO) thin films were prepared on a plastic substrate (PMMA) by RF magnetron sputtering. A novel deposition system where the plasma deposition region and the resistive heating region are separated in space to minimize the thermal damage to the polymer substrate was utilized. The effects of intentional heating and oxygen addition on microstructure and electrical transport properties of ITO films were investigated. Conductivity of ITO films was found to be strongly dependent on their crystallinity. High conductive (sheet resistance similar to 19 Omega/sq) and transparent (above 85%) ITO thin films (150 nm) could be obtained with a moderate heating of substrate (about 70 degrees C) and without introduction of oxygen gas during the deposition. It was observed that amorphous layer with thickness of similar to 80 nm was ormed at the interface oil the polymer substrate and polycrystalline ITO was deposited above this thickness. Dependence of the electrical resistivity of ITO films on their thickness was also discussed. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：927 / 931

页数：5

共 18 条

[1] Effect of laser irradiation on the properties of indium tin oxide films deposited at room temperature by pulsed laser deposition [J].

Adurodija, FO ;

Izumi, H ;

Ishihara, T ;

Yoshioka, H ;

Motoyama, M ;

Murai, K .

VACUUM, 2002, 67 (02) :209-216

[2] EFFECT OF SUBSTRATE-TEMPERATURE ON THE ELECTRICAL AND OPTICAL-PROPERTIES OF REACTIVELY EVAPORATED INDIUM TIN OXIDE-FILMS [J].

BALASUBRAMANIAN, N ;

SUBRAHMANYAM, A .

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1988, 1 (3-4) :279-281

[3] Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO films [J].

Bender, M ;

Seelig, W ;

Daube, C ;

Frankenberger, H ;

Ocker, B ;

Stollenwerk, J .

THIN SOLID FILMS, 1998, 326 (1-2) :72-77

[4] Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films [J].

Bhagwat, S ;

Howson, RP .

SURFACE & COATINGS TECHNOLOGY, 1999, 111 (2-3) :163-171

[5] ANOMALOUS OPTICAL ABSORPTION LIMIT IN INSB [J].

BURSTEIN, E .

PHYSICAL REVIEW, 1954, 93 (03) :632-633

[6] EVAPORATED SN-DOPED IN2O3 FILMS - BASIC OPTICAL-PROPERTIES AND APPLICATIONS TO ENERGY-EFFICIENT WINDOWS [J].

HAMBERG, I ;

GRANQVIST, CG .

JOURNAL OF APPLIED PHYSICS, 1986, 60 (11) :R123-R159

[7] Effects of heat treatment on properties of ITO films prepared by rf magnetron sputtering [J].

Hu, YL ;

Diao, XG ;

Wang, C ;

Hao, WC ;

Wang, TM .

VACUUM, 2004, 75 (02) :183-188

[8] Low temperature deposition of ITO thin films by ion beam sputtering [J].

Kim, D ;

Han, Y ;

Cho, JS ;

Koh, SK .

THIN SOLID FILMS, 2000, 377 :81-86

[9] Indium tin oxide thin films grown on flexible plastic substrates by pulsed-laser deposition for organic light-emitting diodes [J].

Kim, H ;

Horwitz, JS ;

Kushto, GP ;

Kafafi, ZH ;

Chrisey, DB .

APPLIED PHYSICS LETTERS, 2001, 79 (03) :284-286

[10] Dependence of the sheet resistance of indium-tin-oxide thin films on grain size and grain orientation determined from X-ray diffraction techniques [J].

Kulkarni, AK ;

Schulz, KH ;

Lim, TS ;

Khan, M .

THIN SOLID FILMS, 1999, 345 (02) :273-277

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