Gas temperature and electron temperature measurements by emission spectroscopy for an atmospheric microplasma

被引:63
作者
Mariotti, Davide [1 ]
Shimizu, Yoshiki [1 ]
Sasaki, Takeshi [1 ]
Koshizaki, Naoto [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, AIST, NARC, Tsukuba, Ibaraki 3058565, Japan
基金
日本学术振兴会;
关键词
MICROCAVITY PLASMA-DEVICES; HOLLOW SLOT MICROPLASMAS; IMPACT EXCITATION; CROSS-SECTIONS; MICROSCALE PLASMA; METASTABLE LEVELS; PRESSURE; ARGON; PHYSICS; CARBON;
D O I
10.1063/1.2409318
中图分类号
O59 [应用物理学];
学科分类号
摘要
A microplasma suitable for material processing at atmospheric pressure in argon and argon-oxygen mixtures is being studied here. The microplasma is ignited by a high voltage dc pulse and sustained by low power (1-5 W) at 450 MHz. the mechanisms responsible for sustaining the microplasma require a more detailed analysis, which will be the subject of further study. Here it is shown that the microplasma is in nonequilibrium and appears to be in glow mode. The effect of power and oxygen content is also analyzed in terms of gas temperature and electron temperature. Both the gas temperature and the electron temperature have been determined by spectral emission and for the latter a very simple method has been used based on a collisional-radiative model. It is observed that power coupling is affected by a combination of factors and that prediction and control of the energy flow are not always straightforward even for simple argon plasmas. Varying gas content concentration has shown that oxygen creates a preferential energy channel towards increasing the gas temperature. Overall the results have shown that combined multiple diagnostics are necessary to understand plasma characteristics and that spectral emission can represent a valuable tool for tailoring microplasma to specific processing requirements. (c) 2007 American Institute of Physics.
引用
收藏
页数:8
相关论文
共 65 条
[1]   Plasma diagnostics in plasma processing for nanotechnology and nanolevel chemistry [J].
Akatsuka, H .
SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS, 2004, 5 (5-6) :651-655
[2]   Radiative recombination of Ar2+ and enhanced dissociation of O2 in a glow discharge [J].
Al-Jalal, A ;
Khan, MA .
JOURNAL OF APPLIED PHYSICS, 2006, 99 (03)
[3]   INFLUENCE OF ATOM-ATOM COLLISIONS ON THERMAL-EQUILIBRIUM IN ARGON ARC DISCHARGES AT ATMOSPHERIC-PRESSURE [J].
BACRI, J ;
GOMES, AM .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1978, 11 (16) :2185-2197
[4]   ELECTRON-IMPACT EXCITATION OF ARGON ATOM [J].
BALLOU, JK ;
LIN, CC ;
FAJEN, FE .
PHYSICAL REVIEW A, 1973, 8 (04) :1797-1807
[5]   Electron-impact excitation from the (3p54s) metastable states of argon [J].
Bartschat, K ;
Zeman, V .
PHYSICAL REVIEW A, 1999, 59 (04) :R2552-R2554
[6]  
Becker K, 2005, SER PLASMA PHYS, P124
[7]   Microplasmas and applications [J].
Becker, KH ;
Schoenbach, KH ;
Eden, JG .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (03) :R55-R70
[8]   Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2 thin films [J].
Belkind, A. ;
Zhu, W. ;
Lopez, J. ;
Becker, K. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2006, 15 (02) :S17-S25
[9]   A low-power 2.45 GHz microwave induced helium plasma source at atmospheric pressure based on microstrip technology [J].
Bilgiç, AM ;
Voges, E ;
Engel, U ;
Broekaert, JAC .
JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 2000, 15 (06) :579-580
[10]   Physics and modeling of plasma display panels [J].
Boeuf, JP ;
Punset, C ;
Hirech, A ;
Doyeux, H .
JOURNAL DE PHYSIQUE IV, 1997, 7 (C4) :3-14