Method to predict phase formation and specific capacity for lithium in codeposited silicon-transition metal thin films

被引:21
作者
Fleischauer, M. D. [1 ]
Mar, R.
Dahn, J. R.
机构
[1] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2V4, Canada
[2] Dalhousie Univ, Inst Mat Res, Halifax, NS B3H 3J5, Canada
[3] Dalhousie Univ, Dept Phys, Halifax, NS B3H 3J5, Canada
[4] Dalhousie Univ, Dept Chem, Halifax, NS B3H 3J5, Canada
关键词
D O I
10.1149/1.2409860
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A modified version of the effective heat of formation (EHF) model of Pretorius et al. is presented to predict phase formation in codeposited silicon-transition metal films. The EHF model predicts that the first Si - M (transition metal) phase to form in thin-film diffusion couples is the phase with the most negative EHF at the composition of the lowest temperature eutectic (i.e., at the growth interface). Combinatorial thin-film libraries of codeposited Si - M produced using the modified composition spread method of Dahn et al. consist of intimately mixed Si and M atoms. We propose the entire film can be considered as the growth interface and that the Si - M phase with the most negative EHF at a given composition is present. Film nanostructure as a function of composition can then be directly determined from EHF diagrams (assuming regions of Si are amorphous). This information, when combined with the assumption that all Si - M phases are inactive, can be used to predict the specific capacity of all Si-(transition or rare-earth metal) systems in Li/ Si1- xMx cells as a function of composition. (c) 2007 The Electrochemical Society.
引用
收藏
页码:A151 / A155
页数:5
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