Effect of grain size and dislocation density on the performance of thin film polycrystalline silicon solar cells

被引:63
作者
Imaizumi, M
Ito, T
Yamaguchi, M
Kaneko, K
机构
[1] SUMITOMO SITIX CORP,AMAGASAKI,HYOGO 660,JAPAN
[2] TOYOTA CENT RES & DEV LABS INC,NAGAKUTE,AICHI 48011,JAPAN
关键词
D O I
10.1063/1.365341
中图分类号
O59 [应用物理学];
学科分类号
摘要
Three kinds of important properties of the solar cell were calculated: short-circuit current density, open-circuit voltage, and conversion efficiency. Two equations which show the relationship between the minority-carrier diffusion length and the grain size or the etch pit density were used for the calculation. The dependence of the properties on the cell thickness were estimated as a function of grain size and etch-pit density. The effect of the internal reflectance with varying minority-carrier diffusion length was also examined. The results show that thin film polycrystalline silicon solar cells have the potential to attain an efficiency of 17% even at a film thickness of 2 mu m if the grain size is bigger than 10 mu m and the etch-pit density of less than 1 x 10(6) cm(-2). The principal requirement is to achieve efficient light trapping. (C) 1997 American Institute of Physics.
引用
收藏
页码:7635 / 7640
页数:6
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