Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy

被引:96
作者
Maw, W [1 ]
Stevens, F [1 ]
Langford, SC [1 ]
Dickinson, JT [1 ]
机构
[1] Washington State Univ, Dept Phys, Pullman, WA 99164 USA
关键词
D O I
10.1063/1.1510595
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nanometer scale single asperity tribochemical wear of silicon nitride was examined by measuring the wear of atomic force microscope tips translated against a variety of substrates in aqueous solutions. We show that the chemical nature of the substrate plays an important role: significant wear was observed only when the substrate surface is populated with appropriate metal-hydroxide bonds. Mica and calcite substrates, whose water-exposed cleavage surfaces lack these bonds, produced little if any tip wear. As a function of contact force F-N and scan duration t, the length of the tips in this work decreases approximately as (F(N)t)(0.5). We propose that pressure-induced intermediate states involving hydroxyl groups form on both the tip and the substrate; chemical reactions subsequently form transient bridging chemical bonds that are responsible for tip wear. (C) 2002 American Institute of Physics.
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收藏
页码:5103 / 5109
页数:7
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