Electrochromic properties of niobium oxide thin films prepared by DC magnetron sputtering

被引：19

作者：

Yoshimura, K

Miki, T

Tanemura, S

机构：

[1] Natl. Indust. Res. Inst. of Nagoya, Nagoya

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1997年 / 144卷 / 09期

关键词：

D O I：

10.1149/1.1837947

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Niobium oxide electrochromic thin films were prepared by reactive de magnetron sputtering and their electrochromic properties for Li intercalation and durability were studied. Chronoamperometric analyses revealed that the extended space-charge limited model by Zhang et al. is applicable to Nb2O5 films. Crystallized Nb2O5 films showed excellent electrochromism and stability over many coloration-bleaching cycles. The best performance was obtained for films with a substrate temperature of 500 degrees C and an oxygen flow rate of 10 sccm.

引用

页码：2982 / 2985

页数：4

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