Ferromagnetism induced by planar nanoscale CuO inclusions in Cu-doped ZnO thin films

被引:129
作者
Sudakar, C. [1 ]
Thakur, J. S.
Lawes, G.
Naik, R.
Naik, V. M.
机构
[1] Wayne State Univ, Dept Phys & Astron, Detroit, MI 48201 USA
[2] Wayne State Univ, Dept Elect & Comp Engn, Detroit, MI 48202 USA
[3] Univ Michigan, Dept Nat Sci, Dearborn, MI 48128 USA
来源
PHYSICAL REVIEW B | 2007年 / 75卷 / 05期
关键词
D O I
10.1103/PhysRevB.75.054423
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report ferromagnetism above 300 K in ZnO:xCu (x in at. %) sputtered thin films. For x < 1, a large magnetic moment of 1.6 mu(B)/Cu was observed, which decreases monotonically with increasing x. We find evidence that the ferromagnetic moment is due to Cu-O planar nanophase inclusions in ZnO basal planes. The presence of CuO nanophase is confirmed by transmission electron microscopy, x-ray diffraction, and Raman spectroscopy studies. These inclusions are present even for x < 3, where Cu-O structures of a few nanometers in size are observed. Field-cooled and zero-field-cooled magnetization measurements show a bifurcation for temperatures below 300 K.
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页数:6
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