Interaction of rhodium with hydroxylated alumina model substrates

被引:112
作者
Libuda, J
Frank, M
Sandell, A
Andersson, S
Bruhwiler, PA
Baumer, M
Martensson, N
Freund, HJ
机构
[1] LUND UNIV,DEPT SYNCHROTRON RADIAT,S-22100 LUND,SWEDEN
[2] UNIV UPPSALA,DEPT PHYS,S-75121 UPPSALA,SWEDEN
关键词
aluminum; aluminum oxide; chemisorption; growth; low energy electron diffraction; rhodium; soft X-ray photoelectron spectroscopy; water;
D O I
10.1016/S0039-6028(97)00170-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In order to investigate how metal growth and metal-oxide interaction depend on the chemical properties of oxide surfaces, we describe a modification procedure which allows the introduction of surface hydroxyl groups on a well-ordered Al2O3 film on NiAl(IIO). The modification - based an deposition of metallic Al and subsequent water exposure - is characterized using LEED spot-profile analysis (SPA-Leed) and high-resolution photoelectron spectroscopy (PES). Upon Al deposition, small aggregates are formed, which are oxidized completely in the final preparation step as verified via PES. The presence of OH-groups is supported by the appearance of additional Al 2p and O Is surface features. The origin of oxide core and valence level binding energy shifts induced by the modification procedure is discussed. Growth and metal-substrate interaction of Rh deposited onto the hydroxylated Al2O3 film is compared to Rh growth on the nonmodified oxide surface. It is shown that at 300 K nucleation preferentially occurs on modified oxide areas (SPA-LEED). Photoelectron spectroscopy of both oxide and rhodium core levels points to a direct chemical interaction between the metal and surface hydroxyl groups. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:106 / 119
页数:14
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