Monolayers of a fourth-generation thiol-terminated dendrimer

被引：25

作者：

Emmrich, E

Franzka, S

Schmid, G

机构：

[1] Univ Essen Gesamthsch, Inst Anorgan Chem, D-45117 Essen, Germany

[2] CNRS, Chim Coordinat Lab, F-31077 Toulouse 4, France

来源：

NANO LETTERS | 2002年 / 2卷 / 11期

关键词：

D O I：

10.1021/nl0257871

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A fourth-generation dendrimer with 96 thiol functions at its periphery (G4-SH) is used to generate monolayers on various substrates. Whereas gold surfaces tend to organize the approximately 7-8 nm molecules as islands, on mica surfaces G4-SH gives a filament-like pattern that changes to islands in the course of 24 h. Closed monolayers could be gained on silicon by using a special experimental set up. AFM has been applied to show more or less defect free areas of up to 25 mum(2). The height was determined and found to be reduced by about 70% compared with the size in solution due to the loss of solvent.

引用

页码：1239 / 1242

页数：4

共 14 条

[1] Dendrimer-modified silicon oxide surfaces as platforms for the deposition of gold and silver colloid monolayers: Preparation method, characterization, and correlation between microstructure and optical properties [J].