Temperature dependence of formation of a supported phospholipid bilayer from vesicles on SiO2 -: art. no. 051905

被引：81

作者：

Reimhult, E ^{[1
]}

Höök, F ^{[1
]}

Kasemo, B ^{[1
]}

机构：

[1] Chalmers Univ Technol, Dept Appl Phys, S-41296 Gothenburg, Sweden

来源：

PHYSICAL REVIEW E | 2002年 / 66卷 / 05期

关键词：

D O I：

10.1103/PhysRevE.66.051905

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Adsorption of egg-phosphatidylcholine vesicles and bilayer formation on a SiO2 surface was investigated in the temperature range 278-303 K using the quartz crystal microbalance-dissipation technique. The critical coverage for the vesicle-->bilayer transition is found to decrease with increasing temperature. The temperature dependence of the time-scale characterizing this transition can be represented in the Arrhenius form. Higher temperatures produce a bilayer with fewer trapped, nonruptured vesicles.

引用

页码：4 / 051905

页数：4

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