Gate capacitance coupling of singled-walled carbon nanotube thin-film transistors

被引:149
作者
Cao, Qing
Xia, Minggang
Kocabas, Coskun
Shim, Moonsub
Rogers, John A.
Rotkin, Slava V.
机构
[1] Lehigh Univ, Dept Phys, Bethlehem, PA 18015 USA
[2] Lehigh Univ, Ctr Adv Mat & Nanotechnol, Bethlehem, PA 18015 USA
[3] Univ Illinois, Dept Phys, Urbana, IL 61801 USA
[4] Univ Illinois, Dept Mat Sci & Engn, Dept Chem, Urbana, IL 61801 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2431465
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electrostatic coupling between singled-walled carbon nanotube (SWCNT) networks/arrays and planar gate electrodes in thin-film transistors (TFTs ) is analyzed both in the quantum limit with an analytical model and in the classical limit with finite-element modeling. The computed capacitance depends on both the thickness of the gate dielectric and the average spacing between the tubes, with some dependence on the distribution of these spacings. Experiments on transistors that use submonolayer, random networks of SWCNTs verify certain aspects of these calculations. The results are important for the development of networks or arrays of nanotubes as active layers in TFTs and other electronic devices. (c) 2007 American Institute of Physics.
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页数:3
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