Electronic structure of alkali halide-metal interface: LiCl(001)/Cu(001)

被引：9

作者：

Kiguchi, M

Inoue, H

Saiki, K

Sasaki, T

Iwasawa, Y

Koma, A

机构：

[1] Univ Tokyo, Grad Sch Frontier Sci, Dept Complex Sci & Engn, Bunkyo Ku, Tokyo 1130033, Japan

[2] Univ Tokyo, Grad Sch Sci, Dept Chem, Bunkyo Ku, Tokyo 1130033, Japan

来源：

SURFACE SCIENCE | 2003年 / 522卷 / 1-3期

关键词：

metal-insulator interfaces; electron energy loss spectroscopy (EELS); photoelectron spectroscopy; alkali halides; copper;

D O I：

10.1016/S0039-6028(02)02329-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Electronic structure of the heteroepitaxial LiCl thin film grown on Cu(001) was studied using electron energy loss spectroscopy (EELS) and ultraviolet photoelectron spectroscopy (UPS), as a model system of the insulator/metal interface. The EELS results did not show any change in the band gap of the LiCl film, though the Anderson's prediction indicated that the band gap of an insulator decreased at the insulator/metal interface. The change in the band gap of the LiCl film is discussed by considering Madelung potential and many body effects. The UPS results, on the other hand, showed an upward shift of the Cl 3p with an increasing film thickness. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：84 / 89

页数：6

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